CNSV Consultants' Directory
Consultant Details
System-level analysis and guidance for mask-making and maskless lithography. Technology development from concept and feasibility through system integration. Over 25 years experience in e-beam lithography.
Specialties:
Experience includes:
Intellectual property experience:
Led the team that invented an electron optics which had been considered impossible for the last 30 years. The resulting architecture was capable of writing 32nm node IC designs in 8 hours, far faster than any competitive offering.